X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1986-12-15
1988-04-12
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 85, 378 82, G21K 106, G01T 136
Patent
active
047379731
ABSTRACT:
A focusing X-ray crystal monochromator in which one or more crystal layers having different spacings of lattice plane are stacked on a crystal base. Due to different spacings of lattice plane, the angle of reflection and diffraction of a diverging incident X-ray beam can be so changed that the beam takes a parallel or focusing direction for monochromatization. Thus, the monochromator of the present invention can be applied to the X-ray lithography for transferring a pattern of high resolution or the X-ray analysis such as the fine X-ray diffraction.
REFERENCES:
patent: 4261771 (1981-04-01), Dingle et al.
Underwood and Barbee, "Layered Synthetic Microstructures as Bragg Diffractors for X-rays and Extreme Ultraviolet: Theory and Predicted Performance," 9/81, Applied Optics, 20(17)pp. 3027-3034.
Kimura Takeshi
Kuniyoshi Shinji
Nakayama Yoshinori
Ogawa Taro
Fields Carolyn E.
Hitachi , Ltd.
Hynds Joseph A.
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