Crystal etch monitor

Details Crystal etch monitor Crystal etch monitor

1997-08-25

1999-08-24

Valentine, Donald R.

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

With control responsive to sensed condition

205645, 204224M, C25F 302, C25F 700

Patent

active

059421002

ABSTRACT:
The present application describes apparatus and method for monitoring and controlling the etching of quartz crystals to a desired target frequency by means of monitoring the frequency of a monitor blank that is immersed in the etchant simultaneously with the etch load. Since during etching the thickness removal is the same for monitor and etch load, one can predetermine a monitor target frequency in terms of the load target frequency. The process is terminated upon reaching the monitor target.

REFERENCES:
patent: 2411298 (1946-11-01), Shore
Sauerland, F. "Automatic Frequency Control in Chemical Etching of Quartz Crystal Blanks", publ. in the Proceedings of the 44th Annual Symposium on Frequency Control, 1990 (No Month).

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