Cryopump with selective condensation and defrost

Refrigeration – Low pressure cold trap process and apparatus

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62921, B01D 800

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active

058195459

ABSTRACT:
The cryopanel of a cryopump can be preferentially defrosted to remove an acid-forming or toxic gas while leaving a second gas substantially condensed upon the cryopanel thereby limiting interaction between the vapor phases of the two gases. The cryopanel is warmed to a temperature within a selective defrost range at which the first gas selectively sublimates from the cryopanel. The temperature of the cryopanel is then maintained at a temperature within this range until the cryopanel is substantially cleared of the first gas leaving the second gas substantially undisturbed as a condensate upon the cryopanel. In a preferred embodiment, the cryopanel is maintained at about 50 to 85K during standard operation before being defrosted.

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Daleiden, J., et al., "Chemical analysis of a CI.sub.2 /BCI.sub.3 /IBr.sub.3 chemically assisted ion-beam etching process for GaAs and InP laser-mirror fabrication under cryo-pumped ultrahigh vacuum conditions," J. Vac Sci. Technol., 13(5):2022-2024, (Sep./Oct. 1995).

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