Cryogenic adjustment of hydrogen and carbon monoxide content of

Details Cryogenic adjustment of hydrogen and carbon monoxide content of Cryogenic adjustment of hydrogen and carbon monoxide content of

1997-08-12

1998-11-10

Capossela, Ronald C.

Refrigeration

Cryogenic treatment of gas or gas mixture

Separation of gas mixture

62920, 62931, F25J 100

Patent

active

058327479

ABSTRACT:
The molar ratio of hydrogen and carbon monoxide in synthesis gas is changed by partially condensing at least a portion of the feed gas and separating the partially condensed feed mixture by non-fractionating phase separation. Preferably, the partially condensed feed mixture is separated by a first phase separation into a first liquid stream and a first vapor stream; the first vapor stream is partially condensed and separated by a second phase separation into a second liquid stream and a second vapor stream; the second vapor stream is warmed and expanded to provide refrigeration and partial condensation; and the expanded partially condensed stream is separated by a third phase separation to provide a third liquid stream and a third vapor stream. The synthesis gas product is at least partially derived from the third liquid stream and a portion of the third vapor stream.

REFERENCES:
patent: 4217759 (1980-08-01), Shenoy
patent: 4488890 (1984-12-01), Foerg et al.
patent: 4525187 (1985-06-01), Woodward et al.
patent: 4566886 (1986-01-01), Fabian et al.
patent: 5351491 (1994-10-01), Fabian
patent: 5609040 (1997-03-01), Billy et al.

Affiliated with

Also associated with

Rating

Cryogenic adjustment of hydrogen and carbon monoxide content of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cryogenic adjustment of hydrogen and carbon monoxide content of , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cryogenic adjustment of hydrogen and carbon monoxide content of will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1506044