Crucible for use in molecular beam epitaxial processing

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

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118727, 156DIG83, 156DIG103, C23C 1600

Patent

active

046466800

ABSTRACT:
A crucible is disclosed for use in molecular beam epitaxial processing exhibiting low flux transient behavior as shutters of individual furnaces are opened to initiate the process and with excellent flux uniformity over the surface being processed and over the processing time. The crucible is designed for liquid melts of Group III metals, including Gallium, Indium, and Aluminum.
The crucible comprises a two member construction in which the outer member, which contains the melt, is typically cylindrical and of maximum capacity consistent with the furnace interior, and an inner member having a conical configuration with a small aperture at the bottom for optimum molecular beam formation. The conical member increases the thermal impedance between the melt surface and the interior of the MBE system to reduce the flux transient and increases the uniformity of the molecular beam over the area being processed, and over the time that the process is being conducted.

REFERENCES:
patent: 4181544 (1980-01-01), Cho
patent: 4352784 (1982-10-01), Lin
patent: 4569829 (1986-02-01), Shih

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