Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Reexamination Certificate
2008-07-15
2008-07-15
Gupta, Yogendra N. (Department: 1791)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
C117S207000, C117S220000, C117S012000, C117S018000, C117S031000, C117S049000, C117S081000, C117S083000
Reexamination Certificate
active
10563087
ABSTRACT:
Provided are a crucible which prevents polycrystal formation to easily allow growth of optical part material single crystals, and a single crystal growth method employing the crucible. The crucible has a smooth surface of about Rmax 3.2s as the surface roughness of the wall surface1H, concave curved plane1J, cone surface1F and convex curved plane1L of the starting material carrying section1D and the wall surface1K of the seed carrying section1E, which constitute the inner surface of the crucible of a crucible body1A.
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Translation of International Preliminary Report dated Jan. 7, 2005.
Ishibashi Hiroyuki
Senguttuvan Nachimuthu
Sumiya Keiji
Antonelli, Terry Stout & Kraus, LLP.
Gupta Yogendra N.
Hitachi Chemical Company Ltd.
Malekzadeh Seyed Masoud
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