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Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S311000

Reexamination Certificate

active

07923180

ABSTRACT:
A method of fabricating a device is presented. The method includes forming a mask that includes multiple images. A substrate is patterned using the mask. An image of the multiple images corresponds to a respective patterning process. The substrate is processed further to complete the processing of the substrate to form the desired function of the device.

REFERENCES:
patent: 6646722 (2003-11-01), Pierrat
patent: 6710851 (2004-03-01), Elmer et al.
patent: 6968532 (2005-11-01), Sivakumar et al.
Yamamoto Yasuhisa et al., Multi-layer reticle (MLR) strategy application to double-patterning/double-exposure for better overlay error control and mask cost reduction, Photomask Technology 2007, pp. 67302(x), vol. 6730, Robert J. Naber; Hiroichi Kawahira, Editors.

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