Cross-flow reactor

Details Cross-flow reactor Cross-flow reactor

1975-12-29

1978-08-22

Stein, Mervin

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

427 82, 427255, C23C 1308

Patent

active

041081064

ABSTRACT:
A cross-flow reactor for single pass reaction of a plurality of semiconductor wafers with process gas at spaced locations within a heated reactor chamber. The process gas flows along a heated length of the chamber, counterflows to at least three spaced locations within the chamber, traverses the longitudinal axis of the chamber at the spaced locations and then exhausts from the chamber. In a particular embodiment, two or more different process gases are delivered as separate streams to the spaced locations for convergent cross-flowing thereat.

REFERENCES:
patent: 2700365 (1955-01-01), Pawlyk
patent: 3384049 (1968-05-01), Capita
patent: 3461836 (1969-08-01), Henker
patent: 3471326 (1969-10-01), Kappelmeyer et al.
patent: 3494743 (1970-02-01), Baughman et al.
patent: 3578495 (1971-05-01), Pammer et al.
patent: 3637434 (1972-01-01), Nakanuma
patent: 3660179 (1972-05-01), Desmond et al.
patent: 3710757 (1973-01-01), Porter
patent: 4018183 (1977-04-01), Meuleman
Emitter Diffusion System, IBM Technical Disclosure Bulletin, vol. 13, No. 6, Nov. 1970, R. Eshbach et al., p. 1459.

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