Critical orifice dilution system and method

Fluid handling – Systems – Multiple inlet with single outlet

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

137100, 137896, B01F 302

Patent

active

052614522

ABSTRACT:
An apparatus and method are provided for preparing low concentration gas phase calibration standards. The flows of a standard mixture of impurity in a gas and a dilution gas are controlled by regulating the pressure upstream of respective calibrated orifices. The pressures of the gas flows are regulated such that a critical flow condition is maintained through the orifices. The two flows are then combined to obtain a known dilution of the impurity in the gas.

REFERENCES:
patent: 3087004 (1963-04-01), Thorsheim
patent: 3464434 (1969-09-01), Nielsen
patent: 3521658 (1970-07-01), Sandow
patent: 3841344 (1974-10-01), Slack
patent: 3905394 (1975-09-01), Jerde
patent: 4408893 (1983-10-01), Rice
patent: 4498496 (1985-02-01), Barcellona
patent: 4842827 (1989-06-01), Graf et al.
patent: 4878510 (1989-11-01), Kasper et al.
Soviet Inventions Illustrated Week B48, Jan. 16, 1980, Derwent Publications Ltd., London, AN L1921B/48 & SU-A-652 445 (Agranovskii) Mar. 18, 1979, Abstract.
Soviet Inventions Illustrated Section Ch, Week 8848, Jan. 18, 1989, Derwent Publications Ltd., London Class J, AN 88-344607/48 & SU-A-1 392 381 (Karashev) Apr. 30, 1988, Abstract.
Measurement Techniques, vol. 24, No. 3, Mar. 1981, New York, Roman'ko et al., "Metrological Certification of a dynamic Gas-mixing Installation", p. 244.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Critical orifice dilution system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Critical orifice dilution system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Critical orifice dilution system and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-16564

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.