Critical orifice dilution system and method

Details Critical orifice dilution system and method Critical orifice dilution system and method

1992-03-27

1993-11-16

Nilson, Robert G.

Fluid handling

Systems

Multiple inlet with single outlet

137100, 137896, B01F 302

Patent

active

052614522

ABSTRACT:
An apparatus and method are provided for preparing low concentration gas phase calibration standards. The flows of a standard mixture of impurity in a gas and a dilution gas are controlled by regulating the pressure upstream of respective calibrated orifices. The pressures of the gas flows are regulated such that a critical flow condition is maintained through the orifices. The two flows are then combined to obtain a known dilution of the impurity in the gas.

REFERENCES:
patent: 3087004 (1963-04-01), Thorsheim
patent: 3464434 (1969-09-01), Nielsen
patent: 3521658 (1970-07-01), Sandow
patent: 3841344 (1974-10-01), Slack
patent: 3905394 (1975-09-01), Jerde
patent: 4408893 (1983-10-01), Rice
patent: 4498496 (1985-02-01), Barcellona
patent: 4842827 (1989-06-01), Graf et al.
patent: 4878510 (1989-11-01), Kasper et al.
Soviet Inventions Illustrated Week B48, Jan. 16, 1980, Derwent Publications Ltd., London, AN L1921B/48 & SU-A-652 445 (Agranovskii) Mar. 18, 1979, Abstract.
Soviet Inventions Illustrated Section Ch, Week 8848, Jan. 18, 1989, Derwent Publications Ltd., London Class J, AN 88-344607/48 & SU-A-1 392 381 (Karashev) Apr. 30, 1988, Abstract.
Measurement Techniques, vol. 24, No. 3, Mar. 1981, New York, Roman'ko et al., "Metrological Certification of a dynamic Gas-mixing Installation", p. 244.

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