Creation of capacitors equipped with means to reduce the...

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

Reexamination Certificate

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C361S301400, C361S312000, C361S313000, C361S321100, C361S321200

Reexamination Certificate

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07916449

ABSTRACT:
The method for forming the microelectronic device having at least one two or three dimensional capacitor includes creating, on a substrate, a plurality of components and a number of superimposed metal interconnection levels. An insulating layer is formed above a metal interconnection level, and a horizontal metal zone of a next metal interconnection level in which one or more of the insulating blocks created from this insulating layer are incorporated is formed therein. The zone is designed to form a lower structural part of the capacitor.

REFERENCES:
patent: 6251740 (2001-06-01), Johnson et al.
patent: 6441419 (2002-08-01), Johnson et al.
patent: 6459562 (2002-10-01), KarRoy et al.
patent: 6765255 (2004-07-01), Jin et al.
patent: 6876027 (2005-04-01), Lien et al.
patent: 7253075 (2007-08-01), Hieda
patent: 7508648 (2009-03-01), Ahn et al.
patent: 7508649 (2009-03-01), Kwon et al.
patent: 7596842 (2009-10-01), Andresakis et al.
patent: 7741188 (2010-06-01), Dyer et al.
patent: 2001/0020713 (2001-09-01), Yoshitomi et al.
patent: 2002/0163029 (2002-11-01), Dirnecker et al.
patent: 2003/0183862 (2003-10-01), Jin et al.
patent: 2004/0232557 (2004-11-01), Kim
patent: 2006/0076596 (2006-04-01), Ohkubo et al.
patent: 2006/0234464 (2006-10-01), Giraudin et al.
patent: 2884646 (2006-10-01), None
patent: 2390223 (2003-12-01), None
“Single Mask Metal-Insulator-Metal (MIM) Capacitor with Copper Damascene Metallization for Sub-0.18μm Mixed Mode Signal and System-on-a-Chip (SoC) Applications”, Liu et al., Proceedings of the IEEE 2000 International Interconnect Technology Conference (CAT. No. 00EX407), IEEE Piscataway, NJ, USA, 2000, pp. 111-113, XP002460408, ISBN: 0-7803-6327-2.

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