Creation of an electrically conducting bonding between two...

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S459000, C438S652000, C257SE21607

Reexamination Certificate

active

10069517

ABSTRACT:
A method of creating an electrically conducting bonding between a face of a first semiconductor element and a face of a second semiconductor element using heat treatment. The method applies the faces one against the other with the placing between them of at least one layer of a material configured to provide, after heat treatment, an electrically conducting bonding between the two faces. The deposited layers are chosen so that the heat treatment does not induce any reaction product between said material and the semi-conductor elements. Then, a heat treatment is carried out.

REFERENCES:
patent: 4826787 (1989-05-01), Muto et al.
patent: 5349207 (1994-09-01), Malhi
patent: 5374564 (1994-12-01), Bruel
patent: 5387555 (1995-02-01), Linn et al.
patent: 5441911 (1995-08-01), Malhi
patent: 5877070 (1999-03-01), Goesele et al.
patent: 5973257 (1999-10-01), Cantarini et al.
patent: 6118181 (2000-09-01), Merchant et al.
patent: 6251754 (2001-06-01), Ohshima et al.
patent: 6255731 (2001-07-01), Ohmi et al.
patent: 6423614 (2002-07-01), Doyle
patent: 0 587 996 (1994-03-01), None
Yallup et al. “Buried Wsix SOI structures”, Oct. 1995, IEEE, pp. 137-138.
Goh et al. “Buried metallic layers in silicon using wafer fusion bonding techniques”, Jun. 1994, IEEE, pp. 625-628.
Yallup et al. “Buried Wsix SOI Structures”, Oct. 1995, IEEE, pp. 137-138.
Goh et al. “Buried metallic Layers In silicon using wafer fusion bonding techniques”, Jun. 1994, IEEE, pp. 625-628.
C.L. Shieh et al.: “A 1.3 mu m InGaAsP ridge waveguide laser on GaAs and silicon substrates by thin-film transfer” Third International Conference on Indium Phosphide and Related Materials, Cardiff, UK, pp. 272-275 Apr. 8, 1991-Apr. 11, 1991.
Y. Lu et al.: “Eutectic bonding for inducing in-plane strain in GaAs and GaAs-AIGaAs MQW thin films” Advanced Metallization for Devices and Circuits—Science, Technology, and Manufacturability Symposium, pp. 607-612 Apr. 4, 1994-Apr. 8, 1994.
R.F. Wolffenbuttel: “Low-temperature intermediate Au-Si wafer bonding: eutectic or silicide bond” Sensors and Actuators A (Physical), vol. A62, No. 1-3, pp. 680-686 Jul. 1997.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Creation of an electrically conducting bonding between two... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Creation of an electrically conducting bonding between two..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Creation of an electrically conducting bonding between two... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3775201

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.