Creating method of simulation model, manufacturing method of...

Details Creating method of simulation model, manufacturing method of... Creating method of simulation model, manufacturing method of...

2007-05-30

2010-11-23

Frejd, Russell (Department: 2128)

Data processing: structural design, modeling, simulation, and em

Modeling by mathematical expression

C703S013000, C716S030000, C716S030000

Reexamination Certificate

active

07840390

ABSTRACT:
A method of creating a simulation model, includes acquiring a CD value of a photoresist pattern actually formed based upon a test pattern, acquiring information about a shape of the photoresist pattern, acquiring an intensity distribution of an optical image based upon the test pattern by performing simulation, acquiring an empirical threshold defined according to a CD value on the intensity distribution, which corresponds to the CD value of the photoresist pattern, acquiring a parameter of the optical image based upon the intensity distribution of the optical image, acquiring a first correlation between the information about the shape of the photoresist pattern and the parameter of the optical image, acquiring a second correlation between the information about the shape of the photoresist pattern and the empirical threshold, and acquiring a third correlation between the parameter of the optical image and the empirical threshold by using first and second correlations.

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patent: 2006-126532 (2006-05-01), None
Cobb, N. et al., “Mathematical and CAD Framework for Proximity Correction,” SPIE, vol. 2726, pp. 208-221, (1996).

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