Creating and applying variable bias rules in rule-based...

Details Creating and applying variable bias rules in rule-based... Creating and applying variable bias rules in rule-based...

2011-03-15

2011-03-15

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Analysis and verification

C716S051000, C716S052000, C716S054000, C716S055000, C716S056000, C430S005000, C430S030000

Reexamination Certificate

active

07908572

ABSTRACT:
An optical proximity correction (OPC) based integrated circuit design system and method introduce a variable rule in which rules are specified in terms of multiple correction actions that yield acceptable results. This category of rules provides more degrees of freedom in actual application so that the rule-based OPC tool can intelligently select the proper valid rule that minimizes the OPC complexity or meets other objectives.

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