Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2007-11-27
2007-11-27
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S311000, C430S313000, C430S315000, C430S322000, C430S325000, C430S510000
Reexamination Certificate
active
11535429
ABSTRACT:
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
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Klekotka James E.
Willis James E.
DLA Piper (US) LLP
Tokyo Electron Limited
Young Christopher G.
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