Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1988-05-20
1989-09-19
Richman, Barry S.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
4232451, 422173, 42218629, 118723, B01J 800, F01N 310
Patent
active
048679526
ABSTRACT:
Effluent process gases, particularly those employed in the production and processing of solid state electronic components, are cracked to form products having a condensed phase, which may be separated from the flowing process gas. A plasma trap comprises a high frequency coil for producing a plasma therein. The walls of the trap may be cooled and the trap may employ a removable wall on which the cracked product collects. Particular gases that may be treated are arsine, phosphine, disilane, silane, germane, organometallics and gases containing beryllium and boron.
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patent: 3024009 (1962-03-01), Booth, Jr. et al.
patent: 3625846 (1971-12-01), Murdoch et al.
patent: 3862043 (1975-01-01), Haakenson
patent: 4613485 (1986-09-01), Parry et al.
patent: 4746500 (1988-05-01), Parry et al.
Process Technology Limited, "PTL's Post Reaction Chamber (PRC) for Reactive Trapping of Toxic Process Effluents", no known publication date, pp. 1-18 Oromocto, New Brunswick, Canada.
Baumann John A.
Schachter Rozalie
Viscogliosi Marcello
American Cyanamid Company
Davis IV F. Eugene
Griffith Rebekah A.
Richman Barry S.
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