Counter flow device for electroplating apparatus

Details Counter flow device for electroplating apparatus Counter flow device for electroplating apparatus

1984-07-03

1985-02-19

Tufariello, Thomas

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C25D 1700

Patent

active

045004005

ABSTRACT:
A counter flow device for a plating apparatus including a rotary drum with its substantially half part immersed in a plating solution in a plating bath, about which a metallic strip to be plated passes in synchronism with rotation of said rotary drum and anodes spaced apart by radial gaps from the strip for causing electric current to flow between the strip and the anodes. According to the invention the counter flow device comprises a bottom nozzle arranged at a bottom of the bath and directing in a direction substantially opposite to an entering direction of the strip thereat and a top nozzle having a nozzle opening whose tip end is immersed in the proximity of a surface of the plating solution at a location where the strip leaves the plating solution, thereby ensuring uniform counter flows over entire gaps between the metallic strip and anodes to remarkably increase critical current density in plating and advantageously realize uniform plating.

REFERENCES:
patent: 3483098 (1969-12-01), Kramer
patent: 3634223 (1972-01-01), Carter
patent: 3855108 (1974-12-01), Bolz

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