Drug – bio-affecting and body treating compositions – Preparations characterized by special physical form – Cosmetic – antiperspirant – dentifrice
Reexamination Certificate
1999-05-26
2001-08-28
Dees, Jose′ G. (Department: 1616)
Drug, bio-affecting and body treating compositions
Preparations characterized by special physical form
Cosmetic, antiperspirant, dentifrice
C424S070100, C424S070110, C424S070120, C424S070121, C424S070122, C514S772100, C514S772200, C514S772300
Reexamination Certificate
active
06280748
ABSTRACT:
CROSS-REFERENCE TO RELATED APPLICATIONS
Not applicable.
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
Not applicable.
REFERENCE TO A MICROFICHE APPENDIX
Not applicable.
FIELD OF THE INVENTION
The present invention relates to cosmetic raw materials, in particular to cosmetic raw materials which impart excellent compounding stability, a pleasant sense of use, and surface protection properties to cosmetic products. The invention also relates to cosmetic products, and to a method of manufacturing the cosmetic products.
BACKGROUND OF THE INVENTION
It is known to use a copolymer of an organopolysiloxane and a radical-polymerizable monomer as a cosmetic raw material. For example, Japanese Laid-Open Patent Application Kokai No. 5-924 suggests using a vinyl polymer obtained by polymerizing a dimethylpolysiloxane oligomer that contains methacrylic groups with tertiary butyl acrylate and methacrylic acid as a base oil for a hair conditioner. Japanese Laid-Open Patent Application Kokai No. 9-59132 discloses a hair cosmetic material which contains an alternating block copolymer of a polydimethylsiloxane and a polyoxyalkylene. Furthermore, Japanese Laid-Open Patent Application Kokai No. 9-208,422 discloses a cosmetic composition which contains an emulsion obtained by polymerizing an organopolysiloxane with butyl acrylate, methacrylic acid, styrene, and acrylic acid. However, these cosmetic raw materials have poor affinity to other cosmetic raw materials and show unsatisfactory compounding stability with respect to cosmetic products. While these cosmetic raw materials impart hydrophobic properties and smoothness to cosmetic products, they impair adhesion to hair and skin, can be easily removed from hair and skin, and impair surface-protective properties.
BRIEF SUMMARY OF THE INVENTION
It is an object of the present invention to provide a cosmetic raw material which imparts excellent compounding stability, a pleasant sense of use, and surface-protective properties to cosmetic products. It is another object to provide cosmetic products and a method for the preparation of cosmetic products.
DETAILED DESCRIPTION OF THE INVENTION
The present invention relates to a cosmetic raw material which is composed of a vinyl polymer having a carbosiloxane dendrimer structure in its side molecular chain. The invention also relates to a cosmetic raw material composed of the vinyl-type polymer and a solution or a dispersion of a liquid such as a silicone oil, organic oil, alcohol, and water. The invention also relates to cosmetic products prepared from the cosmetic raw material in combination with other cosmetic raw materials, as well as to a method for their preparation.
The cosmetic raw material of the present invention is characterized by a vinyl-type polymer which has in its side molecular chain a carbosiloxane dendrimer structure. The term “carbosiloxane dendrimer structure” in the context of the present invention is a structure with high-molecular-weight groups branched with high regularity in a radial direction from a single core. Such carbosiloxane dendrimer structures are described in the form of a highly-branched siloxane-silalkylene copolymer in Japanese Laid-Open Patent Application Hei 11-1530.
In the cosmetic raw material of the present invention, the carbosiloxane dendrimer structure of a vinyl-type polymer can be represented by the following general formula:
where Z is a divalent organic group such as an alkylene group, an arylene group, an aralkylene group, an ester-containing divalent organic group, an ether-containing divalent organic group, a ketone-containing divalent organic group, or an amide-containing divalent organic group. Preferable organic groups are represented by the following formulae:
where R
9
is an alkylene group with 1 to 10 carbon atoms such as a methylene group, ethylene group, propylene group, or butylene group, with the methylene group and propylene group being preferable; R
10
is represented by an alkyl group having 1 to 10 carbon atoms, such as a methyl group, an ethyl group, a propyl group, or a butyl group, with the methyl group being preferable; R
11
is represented by an alkylene group having 1 to 10 carbon atoms, such as a methylene group, an ethylene group, a propylene group, a butylene group, with the ethylene group being preferable; d is an integer between 0 and 4; and e is 0 or 1. R
1
is an alkyl group or an aryl group with 1 to 10 carbon atoms where the alkyl group is represented by a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, an isopropyl group, an isobutyl group, a cyclopentyl group, or a cyclohexyl group; the aryl group is represented by a phenyl group and a naphthyl group. The methyl and phenyl group are preferable, but the methyl group is most preferable. X
1
represents a silylalkyl group expressed by the following formula when i is equal to one:
In this formula, R
1
is the same as defined above, R
2
is an alkylene group having 2 to 10 carbon atoms such as an ethylene group, a propylene group, a butylene group, a hexylene group, or a similar linear alkylene group; a methylmethylene group, a methylethylene group, 1-methylpentylene group, 1,4-dimethylbutylene group or a similar branched alkylene group. The ethylene group, methylethylene group, hexylene group, 1-methylpentylene group, and 1,4-dimethylbutylene group are preferable. R
3
is an alkyl group having 1 to 10 carbon atoms, such as a methyl group, an ethyl group, a propyl group, a butyl group, and an isopropyl group. In the above formula, i is an integer between 1 and 10 that shows the generation of the silylalkyl group; and a
i
is an integer from 0 to 3.
The following vinyl-type polymer which contains a carbosiloxane dendrimer structure is preferable for the cosmetic raw material of the present invention:
(A) 0 to 99.9 parts by weight of a vinyl-type monomer; and
(B) 100 to 0.1 parts by weight of a carbosiloxane dendrimer which contains a radical-polymerizable organic group represented by the following general formula:
where Y is a radical-polymerizable organic group, R
1
is an aryl group or an alkyl group having 1 to 10 carbon atoms, wherein the alkyl group is represented by a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, an isopropyl group, an isobutyl group, a cyclopentyl group, a cyclohexyl group, and where the aryl group is represented by a phenyl group and a naphthyl group, where the methyl and phenyl group are preferable and the methyl group is most preferable; and X
1
is a silylalkyl group which, when i=1, is expressed by the following formula:
where R
1
is the same as defined above, R
2
is an alkylene group with 2 to 10 carbon atoms R
3
is an alkyl group having 1 to 10 carbon atoms; X
i+1
is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, or the silylalkyl group; i is an integer from 1 to 10 which shows the generation of the silylalkyl group, and a
i
is an integer from 0 to 3.
The vinyl-type monomer which is component (A) in the vinyl-type polymer of the present invention is a vinyl-type monomer which contains a radical polymerizable vinyl group. There are no particular limitations with regard to the type of such a monomer. The following are examples of this vinyl-type monomer: methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, or similar lower alkyl methacrylate; glycidyl methacrylate; n-butyl methacrylate, isobutyl methacrylate, tert-butyl methacrylate, n-hexyl methacrylate, methacrylic acid, cyclohexyl-2-ethylhexyl methacrylate, octyl methacrylate, lauryl methacrylate, stearyl methacrylate, or similar higher methacrylate; vinyl acetate, vinyl propionate, or similar lower fatty acid vinyl ester; vinyl caproate, vinyl-2-ethylhexoate, vinyl laurate, vinyl stearate, or similar higher fatty acid ester; styrene, vinyl toluene, benzyl methacrylate, phenoxyethyl methacrylate, vinyl pyrrolidone, or similar aromatic vinyl monomers; methacrylamide, N-methylol methacrylamide, N-methoxymethyl methacrylamide, isobutoxymethox
Aso Takayuki
Furukawa Haruhiko
Hamachi Tadashi
Morita Yoshitsugu
Cesare James L. De
Choi Frank
Dees Jose′ G.
Dow Corning Toray Silicone Ltd.
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