Cosmetic compositions containing hydrofluorocarbon compounds

Details Cosmetic compositions containing hydrofluorocarbon compounds Cosmetic compositions containing hydrofluorocarbon compounds

1995-03-21

1998-01-06

Vennat, Jyothsan

Drug, bio-affecting and body treating compositions

Preparations characterized by special physical form

Cosmetic, antiperspirant, dentifrice

424 59, 424 61, 424 63, 424 64, 424 701, 424 706, 424 707, 514844, 514846, 514937, 568 27, 568 32, 568 74, A61K 748

Patent

active

057051658

DESCRIPTION:

BRIEF SUMMARY
This application is a 371 of PCT/FR94 00633 filed on Jun. 1, 1994.
The present invention concerns the use of hydro- and fluorocarbon compounds in cosmetic compositions, cosmetic compositions containing these compounds and certain hydro- and fluorocarbon sulfoxides or sulfones.
Perfluoropolyethers are known for their use in cleaning, protecting or making up the skin or washing hair. These compounds are known to have a low surface tension and are easy to spread, but have very low solubility in most fluids apart from fluorine-containing fluids. This means that they are difficult to incorporate in cosmetic composition formulations. Some of these compounds, perfluoromethylisopropylethers, are sold by MONTEFLUO under the trade name "FOMBLIN HC".
We have now discovered compounds which, contrary to FOMBLIN compounds, have good solubility properties, in particular in the conventional solvents used in cosmetics, such as low alcohols, fatty substances and the usual oils. Their amphiphilic character, properties and compatibility with the solvents mean that homogeneous, stable compositions can be prepared and, for example, can ensure that the emulsions they form have good stability.
The present invention thus concerns the use of compounds with formula: ##STR3## R.sub.F represents a perfluorinated C.sub.4 -C.sub.20 alkyl radical or a mixture of perfluorinated C.sub.4 -C.sub.20 alkyl radicals; a mixture of linear or branched C.sub.1 -C.sub.22 alkyl radicals, an aryl radical or an aralkyl radical; ##STR4## in a cosmetic composition.
Preferred compounds are those for which R.sub.F represents a perfluorinated C.sub.6 -C.sub.12 alkyl radical, R.sub.H represents a linear or branched C.sub.3 -C.sub.18 alkyl radical, a C.sub.6 -C.sub.10 aryl radical or a C.sub.7 -C.sub.15 aralkyl radical, and n equals 2.
Preferably, X and Y represent S.
Examples of linear or branched alkyl radicals are butyl, octyl, 2-ethylhexyl, decyl, dodecyl, 2-butyloctyl, hexadecyl, 2-hexyldecyl, and octadecyl radicals.
Examples of aralkyl radicals are 4-nonylphenyl and benzyl radicals, and an example of an aryl radical is the phenyl radical.
Compounds with formula (I) in accordance with the invention can be prepared by reacting a fluorine compound containing an acidic hydrogen with formula (II): ##STR5## or by reacting a hydrocarbon containing an acidic hydrogen with formula (IV): ##STR6## in the presence of an acidic or basic compound which acts as a reactant or as a catalyst, to produce the corresponding compound with formula (I). Substituents R.sub.F, R.sub.H and n have the same meanings in formulae (II), (III), (IV) and (V) as those given for formula (I). The mercaptan function can be optionally oxidized to the sulfoxide or sulfone using an oxidizing agent, preferably hydrogen peroxide in an acidic medium.
Compounds with formula (V) are described in U.S. Pat. 3,976,698, in European patent application EP-A-0 300 358 and in German patent application DE-A-2 018 461.
The compounds which act as a reactant or as a catalyst may thus be basic, such as alkali metals, alkali or alkaline earth metal hydroxides, alkali metal alcoholates such as methylates or tertiobutylates, alkaline hydrides such as sodium hydride, or tertiary amines such as pyridine or triethylamine. They may also be Lewis bases, for example cesium, rubidium or potassium fluorides. These compounds may be supported on a solid support such as alumina. Preferably, an alkali alcoholate such as sodium methylate or a tertiary amine such as pyridine is used.
These compounds may also be acids, in particular when the starting material with formula (II) or (IV) is an alcohol. These acids may be inorganic acids or their tertiary amine salts, or Lewis acids such as boron trifluoride, tin tetrachloride, or antimony pentachloride, used neat, in solution or associated with any normal support.
A basic compound is preferably used.
The concentration of acid or basic compounds acting as reactant or catalyst and used in preparing compounds with formula (I) can be between 1% and 100% molar, preferably between 2% and

Affiliated with

Also associated with

Rating

Cosmetic compositions containing hydrofluorocarbon compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cosmetic compositions containing hydrofluorocarbon compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cosmetic compositions containing hydrofluorocarbon compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2326601