Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1987-08-28
1989-10-10
Kalafut, Stephen J.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
524901, C05D 1300
Patent
active
048729612
ABSTRACT:
Cathodic electrodepositable coating compositions comprising an aqueous dispersion of (1) at least one cationic epoxy-based resin, (2) at least one blocked isocyanate crosslinker, and (3) a solvent system containing one or more organic solvents are improved by (a) employing a blocked isocyanate crosslinker which deblocks at a temperature of less than about 160.degree. C., and (b) employing as the solvent system, one which is substantially free of any organic solvent which will react with isocyanate groups at the temperature employed to cure said coating.
REFERENCES:
patent: 4007154 (1977-02-01), Schimmel et al.
patent: 4038232 (1977-07-01), Bosso et al.
patent: 4097352 (1978-06-01), Bosso et al.
patent: 4134864 (1979-01-01), Belanger
patent: 4134865 (1979-01-01), Tominaga
patent: 4176221 (1979-11-01), Shimp
patent: 4285789 (1981-08-01), Kobayashi et al.
patent: 4292217 (1981-09-01), Spencer
patent: 4310646 (1982-01-01), Kempter et al.
patent: 4575523 (1986-03-01), Anderson et al.
patent: 4596744 (1986-06-01), Anderson et al.
patent: 4605690 (1986-08-01), Debry et al.
patent: 4608313 (1986-08-01), Hickner et al.
Anderson Kenneth W.
Hickner Richard A.
McIntyre John M.
Rao Nancy A.
Kalafut Stephen J.
The Dow Chemical Company
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