Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1989-05-18
1991-06-11
Pal, Asok
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 3, 134 28, 134 41, 252392, 252393, B08B 308
Patent
active
050229265
ABSTRACT:
A method of removing iron contaminants in an aqueous system by introducing and maintaining within the system at least one ortho dihydroxyaromatic compound having at least one electron withdrawing group pendant from the aromatic ring and, further, a method of inhibiting calcium scale formation in the presence of iron contaminants by utilizing at least one dehydroxyaromatic compound in combination with calcium scale inhibitors.
REFERENCES:
patent: 2396938 (1946-03-01), Bersworth
patent: 3898037 (1975-08-01), Lange et al.
patent: 4124500 (1978-11-01), Arghiropoulos et al.
patent: 4532068 (1985-07-01), Fuchs et al.
patent: 4728497 (1988-03-01), Muceitelli
patent: 4734203 (1988-03-01), Lin et al.
patent: 4935205 (1990-06-01), Kreh et al.
Proceedings-International Water Conference, Eng. Soc., Westchester, PA (1978) 39 299-308 (Eng).
Water-Formed Scale Deposits by J. C. Cowan et al., p. 277 (1976).
Bull. Chem. Soc. Jap. 36 (No. 11) pp. 1408-1411, J.A.C.S. 100:17 5362 (1978).
Clay Minerals (1977) 12 127. Med. Fac. Landbouww. Rijksuniv. Gent 42 (1977) 2025-2029.
Biermans, Med. Far. Landbouww. Rijksuniv. Gent. 42 (1977), 2025-2029.
Biermans, Clay Minerals (1977) 12, 127.
Murekami et al, Bull. Chem. Soc. Jap. (1963), vol. 36, 1408-1411.
Henry Wayne L.
Kelly John A.
Kreh Robert P.
Kuhn Vincent R.
Lundquist Joseph T.
Johnson Beverly K.
Pal Asok
W. R. Grace & Co.,-Conn.
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