Photocopying – Projection printing and copying cameras – Focus or magnification control
Patent
1998-08-20
1999-10-19
Metjahic, Safet
Photocopying
Projection printing and copying cameras
Focus or magnification control
355 53, G03B 2752, G03B 2742
Patent
active
059698012
ABSTRACT:
A apparatus of correction of a mask pattern in which the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point system for arranging a plurality of evaluation points along an outer periphery of the desired design pattern; a simulation system for simulating the transfer image to be obtained where exposure is carried out under predetermined transfer conditions by using a photomask of a design pattern given the evaluation points; a comparison system for comparing a difference between the simulated transfer image and the design pattern for every evaluation point; and a deformation system for deforming the design pattern according to the difference compared for every evaluation point so that the difference becomes smaller.
REFERENCES:
patent: 5124931 (1992-06-01), Iwamatsu et al.
patent: 5206820 (1993-04-01), Ammann et al.
patent: 5442418 (1995-08-01), Murakami et al.
patent: 5656402 (1997-08-01), Kasuga
patent: 5667923 (1997-09-01), Kanata
patent: 5700601 (1997-12-01), Hasegawa et al.
patent: 5792581 (1998-08-01), Ohnuma
Metjahic Safet
Nguyen Hung Henry
Sony Corporation
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