Boots – shoes – and leggings
Patent
1998-08-20
2000-03-28
Gordon, Paul P.
Boots, shoes, and leggings
36416703, 39550022, G06F 1900
Patent
active
060422572
ABSTRACT:
A method of correction of a mask pattern in which the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point arrangement step for arranging a plurality of evaluation points along an outer periphery of the desired design pattern; a simulation step for simulating the transfer image to be obtained where exposure is carried out under predetermined transfer conditions by using a photomask of a design pattern given the evaluation points; a comparison step for comparing a difference between the simulated transfer image and the design pattern for every evaluation point; and a deformation step for deforming the design pattern according to the difference compared for every evaluation point so that the difference becomes smaller and a correction apparatus for the same.
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Gordon Paul P.
Sony Corporation
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