Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating
Reexamination Certificate
2008-08-11
2010-12-28
Wong, Edna (Department: 1759)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly single metal coating
C205S296000
Reexamination Certificate
active
07857961
ABSTRACT:
To provide a copper plating solution composition that precipitates copper plated membranes that are both uniform and smooth and which has good external appearance even if the copper plated membranes that are formed are relatively thin. The copper plating solution composition contains chlorine ions and bromide ions in specific volumes.
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Hayashi Shinjiro
Takiguchi Hisanori
Piskorski John J.
Rohm and Haas Electronic Materials LLC
Wong Edna
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