Copper plating

Coating processes – Measuring – testing – or indicating

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427345, 4274431, C23C 1840

Patent

active

047073772

ABSTRACT:
Copper is plated onto a substrate from an electroless plating bath having a mix potential relative to a saturated calomel electrode of about minus 630 to about minus 675 millivolts at a temperature of about 73.degree. C. The mix potential of the bath is monitored and adjusted during the plating to maintain it at about minus 630 to about minus 675 millivolts with respect to a calomel electrode at a temperature of about 73.degree. C. The number of of plating void defects is thereby reduced.

REFERENCES:
patent: 3635758 (1972-01-01), Schneble
patent: 3844799 (1974-10-01), Undeckofler
patent: 3959531 (1976-05-01), Schneble
patent: 4002786 (1977-01-01), Hirohata
patent: 4152467 (1979-05-01), Alpaugh
Paunovic, "Electrochemical Aspects of Electroless Deposition of Metals", Photo Circuits Corporation, Plating, Nov. 1968, pp. 2-8.
Tucker, "Instrumentation and Control of Electroless Copper Plating Solutions", American Electroplaters' Society, Inc., Ft. Worth, Texas--Jan. 21-22, 1976.
Greene, "Evaluating the Condition of Electroless Plating Baths", IBM TDB, vol. 17, No. 3, Aug. 1964, pp. 171, 172.

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