Copper etchant useful for making fine-line copper elements

Details Copper etchant useful for making fine-line copper elements Copper etchant useful for making fine-line copper elements

1993-11-03

1995-11-21

Fourson, George

Compositions

Etching or brightening compositions

Inorganic acid containing

216105, C23F 134

Patent

active

054684099

ABSTRACT:
Multicurved copper films having fine-line elements suitable for radome applications can be improved by cutting the elements with reproducible precision to close tolerance (typically line widths of 3-10.+-.0.25 mil) using an etchant comprising a concentrated saline solution of CuCl.sub.2.

REFERENCES:
patent: 3753818 (1973-08-01), Poor et al.
patent: 4696717 (1987-09-01), Bissinger
patent: 5298117 (1994-03-01), Hanson et al.

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