Copper electroplating solutions and processes

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

205125, 205298, 106 126, C25D 338

Patent

active

052521966

ABSTRACT:
Compositions and processes for electrolytic plating. The compositions are characterized by critical amounts of one or more brightening and leveling agents. The compositions are particularly useful for plating through hole walls of printed circuit boards, including through holes having an aspect ratio equal or greater than about ten to one.

REFERENCES:
patent: 3267010 (1966-08-01), Creutz et al.
patent: 3328273 (1967-06-01), Creutz et al.
patent: 3770598 (1973-11-01), Cruetz
patent: 3784454 (1974-01-01), Lyde
patent: 3798138 (1974-03-01), Ostrow et al.
patent: 4336114 (1982-06-01), Mayer et al.
patent: 4347108 (1982-08-01), Willis
patent: 4975159 (1990-12-01), Dahms
patent: 5004525 (1991-04-01), Bernards et al.
patent: 5051154 (1991-09-01), Bernards et al.
patent: 5068013 (1991-11-01), Bernards et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Copper electroplating solutions and processes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Copper electroplating solutions and processes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copper electroplating solutions and processes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1901864

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.