Copper electroless deposition on a titanium-containing surface

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427305, 427437, 4274431, 438678, 438687, 438688, B05D 512

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active

060541725

ABSTRACT:
A method for depositing copper on a titanium-containing surface of a substrate is provided. The method includes forming a patterned catalyst material on the substrate, such that the titanium-containing surface is exposed in selected regions. The catalyst material has an oxidation half-reaction potential having a magnitude that is greater than a magnitude of a reduction half-reaction potential of titanium dioxide. Copper is then deposited from an electroless solution onto the exposed regions of the titanium-containing surface.

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