Copper electroless deposition on a titanium-containing surface

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 98, 438648, 438656, 438688, 438903, 438945, 438976, B05D 512, H01L 214763

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active

061269891

ABSTRACT:
A method for depositing copper on a titanium-containing surface of a substrate is provided. The method includes forming a patterned catalyst material on the substrate, such that the titanium-containing surface is exposed in selected regions. The catalyst material has an oxidation half-reaction potential having a magnitude that is greater than a magnitude of a reduction half-reaction potential of titanium dioxide. Copper is then deposited from an electroless solution onto the exposed regions of the titanium-containing surface.

REFERENCES:
patent: 3672986 (1972-06-01), Schneble et al.
patent: 3708329 (1973-01-01), Schonenberg
patent: 3994727 (1976-11-01), Polichette et al.
patent: 4143186 (1979-03-01), Davis
patent: 4209331 (1980-06-01), Kukanskis et al.
patent: 4211564 (1980-07-01), Oka
patent: 4228213 (1980-10-01), Beckenbaugh et al.
patent: 4265943 (1981-05-01), Goldstein et al.
patent: 4273804 (1981-06-01), Feldstein
patent: 4340620 (1982-07-01), Mielsch et al.
patent: 4378384 (1983-03-01), Murakami et al.
patent: 4511597 (1985-04-01), Teng et al.
patent: 4693907 (1987-09-01), Ishikawa
patent: 4699811 (1987-10-01), Kunces
patent: 4720404 (1988-01-01), Culjkovic
patent: 4962058 (1990-10-01), Cronin et al.
patent: 5151168 (1992-09-01), Gilton et al.
patent: 5169680 (1992-12-01), Ting et al.
patent: 5387315 (1995-02-01), Sandhu
Shacham-Diamand, "Narrow copper lines for ULSI Technology", SPIE, 1442, pp. 11-19, 1990.
"Encyclopedia Of Chemical Technology", Third Edition, 8, 745-746 no month available (1979).
Arita, Y., et al., "Copper Metallization Technology for Deep Submicron ULSIs", MRS Bulletin, 68-74 no month available (1994).
Palmans, R., et al., "Development of an Electroless Copper Deposition Bath for Via Fill Applications on Tin Seed Layers", Advanced Metallization for ULSI Applications in 1994 Conference, Materials Research Society, 87-94, Austin, TX, Oct. 4-6, 1994.
Palmans, R., et al., "Feasibility study of electroless copper deposition for VLSI", Applied Surface Science, 53, 345-352 no month available (1991).
Shacham-Diamand, Y., "100 nm wide copper lines made by selective electroless deposition", Journal of Micromechanics and Microengineering, 1, 66-72 no month available (1991).
Shacham-Diamand, Y., "Electrochemically Deposited Copper for ULSI Technology", Proceedings of the Second Symposium on Electrochemically Deposited Thin Films, The Electrochemical Society Proceedings vol. 94-31, 293-301 (undated).
Shacham-Diamand, Y., et al., "Electroless copper deposition for ULSI", Thin Solid Films, 262, 93-103 no month available (1995).
Shacham-Diamand, Y., "Narrow (0.1.mu.m--0.5.mu.m) Copper Lines for Ultra-Large Scale Integration (ULSI) Technology", 7.sup.th Meeting in Israel on Optical Engineering, SPIE, 1442, 11-19 no month available (1990).
Shacham-Diamand, Y., et al., "The Characterization of Electroless Copper Deposition from an Alkali Free Solution", Proceedings of the Second Symposium on Electrochemically Deposited Thin Films, The Electrochemical Society Proceedings Vol. 94-31, 136-145 (Oct. 1994).
Sokal, R., et al., "Biometry", W.H. Freeman & Company, San Francisco, CA, Title Page, Table of Contents no month available (1981).
Wong, S. et al., "Electroless Copper Deposition for Multilevel Metallization", Electronic Packaging Materials Science V, Materials Research Society Symposium Proceedings, Boston, MA, 347-356 (Nov. 26-29, 1990).
Yoshiki, H., et al., "Pattern Formation of Cu Layer by Photocatalytic Reaction of ZnO Thin Film", J. Electrochem. Soc., 142, L235-1237 no month available (1995).
Caturla, F., et al., "Electroless Plating of Graphite with Copper and Nickel", J. Electrochem. Soc, 142, 4084-4090 no month available (1995).
Charbonnier, M., et al., "Plasma Treatment Process for Palladium Chemisorption onto Polymers before Electroless Deposition", J. Electrochem. Soc., 143, 472-480 no month available (1996).
Cho, J., et al., "Electroless Cu for VLSI", MRS Bulletin, 18, 31-38 no month available (1993).
Cornell, J., "Experiments with Mixtures: A Review", Technometrics, 15, 437-455 no month available (1973).
DeSilva, M., et al., "A Novel Seed Layer Scheme to Protect Catalytic Surfaces for Electroless Deposition", J. Electrochem. Soc., 143, 3512-3516 no month (1996).
DeSilva, M., et al., "High Aspect Ratio Microtunnel Technique to Empirically Model Electroless Deposition", J. Electrochem. Soc., 143, L78-L80 no month (1996).
Honma, H., et al., "Electroless Copper Deposition Process Using Glyoxylic Acid as a Reducing Agent", J. Electrochem. Soc., 141, 730-733 no month (1994).
Kondo, K., et al., "Acceleration of Electroless Copper Deposition in the Presence of Excess Triethanolamine", J. Electrochem. Soc., 138, 3629-3633 no month (1991).
Kondo, K. et al., "Effects of 2,2'-Dipyridl on Electroless Copper Deposition in the Presence of Excess Triethanolamine", J. Electrochem. Soc., 140, 1598-1601 no month (1993).
Mak, C., "Electroless Copper Deposition on Metals and Metal Silicides", MRS Bulletin, 19, 55-62 no month (1994).
Mak, C., et al., "Selective electroless copper metallization of palladium silicide on silicon substrates", Appl. Phys. Lett., 59, 3449-3451 no month (1991).
Matsuoka, M., et al., "Kinetics of Electroless Copper Plating and Mechanical Properties of Deposits", J. Electrochem. Soc., 139, 2466-2470 no month (1992).
Mishra, K., et al., "Kinetics and Mechanism of Electroless Deposition of Copper", J. Electrochem. Soc., 143, 510-516 no month (1996).

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