Stock material or miscellaneous articles – Composite – Of metal
Patent
1993-05-25
1996-03-26
Thibodeau, Paul J.
Stock material or miscellaneous articles
Composite
Of metal
20419214, 20419211, 427250, 427533, 428141, 428458, 4284735, 428901, B32B 1508, B32B 1520, B05D 306
Patent
active
055019110
ABSTRACT:
A copper film coated substrate includes a substrate and a copper film formed on a surface of the substrate. The copper film has an X-ray diffraction intensity of 2.0 cps
m or more per unit film thickness at a crystal orientation (111) face of the copper film. A crystal orientation of a copper thin film is controlled by irradiating a surface of a substrate with inert gas ions before forming a copper thin film on the substrate by a physical vapor deposition process. A copper thin film is formed by irradiating a surface of a substrate with ions, and depositing a copper thin film on the irradiated substrate. In the ion irradiating step, an ion irradiation energy for a dosage of the irradiated ions is controlled, so that crystal is greatly grown to be orientated in a direction of copper (111) face with a less dosage of the irradiated ions.
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EPO Search Report.
"Formation of Copper Thin Film by a Low Kinetic Energy Particle Process", Tadahiro Ohmi, 1046 Journal of the Electrochemical Society 138 (1991) Apr., No. 4, Manchester, NH, US.
Ebe Akinori
Kuratani Naoto
Nishiyama Satoshi
Ogata Kiyoshi
Okazaki Taizo
Nissin Electric Co. Ltd.
Sand Stephen
Thibodeau Paul J.
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