Copolymers, process for the preparation thereof and ionizing rad

Details Copolymers, process for the preparation thereof and ionizing rad Copolymers, process for the preparation thereof and ionizing rad

1983-10-28

1985-06-11

Seccuro, Carman J.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526293, 525250, 525310, C08F21236

Patent

active

045230005

ABSTRACT:
Solvent-soluble copolymers having a number average molecular weight of about 1,000 to about 1,000,000 and comprising recurring units of the following formulae (I) and (II) (case A) or recurring unit of the following formulae (I), (II) and (III) (case B) or solvent-soluble graft copolymers having a number average molecular weight of about 1,500 to about 2,000,000 and comprising recurring units of the following formulae (I), (II) and/or (II'), and (IV) (case C) or recurring units of the following formulae (I), (II) and/or (II'), (III) and (IV) (case D), said recurring units being ##STR1## wherein each of R.sub.1, R.sub.2 and R.sub.3 represents independently hydrogen, a straight or branched chain alkyl group having 1 to 4 carbon atoms or a halogen; R.sub.4 represents hydrogen or a straight or branched chain alkyl group having 1 to 10 carbon atoms; R.sub.5 represents an alkyl group having 1 to 6 carbon atoms, a phenyl group or a benzyl group; R.sub.6 represents hydrogen or a methyl group; R.sub.7 represents a straight or branched chain alkyl group having 1 to 10 carbon atoms, an aryl group, an aralkyl group or an aminoalkyl group; and n is an integer of 1 to 50. A resist having an excellent sensitivity to ionizing radiations and a high resolution, and also having a high dry etching resistance is provided by using these copolymers and graft copolymers.

REFERENCES:
patent: 3043817 (1962-07-01), Jahn et al.
patent: 3493636 (1970-02-01), Grunin et al.

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