Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-12-20
1994-08-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430167, 430176, 430191, 430192, 430193, 430196, 430197, 430270, 430272, 430277, 430278, G03F 7021, G03F 709
Patent
active
053427270
ABSTRACT:
A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl and wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.
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Dammel Ralph
Gordon Douglas J.
Hinsberg William D.
McKean Dennis R.
Vicari Richard
Bowers Jr. Charles L.
Chu John S.
Hoechst Celanese Corp.
IBM Corp.
McGinnis James L.
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