Copolymers having O-nitrocarbinol ester groups and production of

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

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430270, 430326, 526263, G03C 170

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048228664

ABSTRACT:
Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 94 to 30 mol % of methacrylonitrile, from 1 to 20 mol % of olefinically unsaturated copolymerizable carboxylic acid and from 0 to 30 mol % of other copolymerizable monomers as copolymerized units are useful for fabricating semiconductor components.

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patent: 4632900 (1986-12-01), Demmer
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Dry Etching Durability of Positive Electron Resists-Harada-Journal of Applied Polymer Science, vol. 26, pp. 3395-3408-1981.
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Effect of Composition on Resist Dry Etching Susceptibility-Herbert, Schmidt & Malkiewicz-Polymers in Electronics-pp. 91-100.

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