Copolymers having o-nitrocarbinol ester groups and preparation t

Details Copolymers having o-nitrocarbinol ester groups and preparation t Copolymers having o-nitrocarbinol ester groups and preparation t

1987-12-08

1989-03-14

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526279, 526284, 5262929, 526311, C08F 2606, C08F 2034

Patent

active

048125423

ABSTRACT:
Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of O-substituted p-hydroxystyrene and from 0 to 30 mol % of other copolymerizable monomers are useful for producing positive-working photoresists and light-sensitive coating materials.

REFERENCES:
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patent: 4343889 (1982-08-01), Reichmanis et al.
patent: 4382120 (1983-05-01), Reichmanis et al.
patent: 4400461 (1983-08-01), Chandross et al.
patent: 4551416 (1985-11-01), Chandross et al.
patent: 4576902 (1986-03-01), Saenger et al.
patent: 4666820 (1987-05-01), Chandross et al.
patent: 4735885 (1988-04-01), Hopf et al.
Journal of Vacuum Science and Technology, p. 1331, 1981.
Introduction to Microlithography, ACS Symp. Ser. 219, L. F. Thomson, C. G. Willson, M. J. Bowden, eds., pp. 215-277, Amer. Chem. Soc., Wash., D.C. (1983).
Polymer, vol. 24, p. 999 (1983).

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