Copolymers from maleimide and aliphatic vinyl ethers and esters

Details Copolymers from maleimide and aliphatic vinyl ethers and esters Copolymers from maleimide and aliphatic vinyl ethers and esters

1986-02-18

1988-01-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430270, 430326, 430330, G03C 160, G03C 1495

Patent

active

047204451

ABSTRACT:
A novel positive photoresist formulation is provided based on a 1:1 copolymer of maleimide and an aliphatic vinyl ether or ester in combination with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation. The copolymers disclosed have structures of the following type: ##STR1## where R is an alkyl substituent of from 1 to 20 carbon atoms, benzyl, C.sub.1 to C.sub.10 aralkyl, C.sub.3 to C.sub.12 cycloalkyl or ##STR2## where R" has the structures assigned to R, and where R' is independently H, C.sub.1 to C.sub.10 alkyl, phenyl, benzyl or C.sub.1 to C.sub.10 aralkyl. The polymers are compounded with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation such as with diazonaphthoquinone sulfonic acid esters and amides. The polymer and sensitizer compositions are dissolved together in a solvent useful for spin casting of thin films on substrates.

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