Copolymer resin of maleimide and alicyclic olefin-based monomers

Details Copolymer resin of maleimide and alicyclic olefin-based monomers Copolymer resin of maleimide and alicyclic olefin-based monomers

1998-09-14

2000-02-22

Baxter, Janet

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

522904, C08F 2606

Patent

active

060281537

ABSTRACT:
The present invention relates to a novel copolymer resin of maleimide and alicyclic olefin-based monomers, a photoresist containing the copolymer and a process for the preparation thereof. More specifically, the present invention relates to a novel copolymer resin of maleimide and alicyclic olefin-based monomers useful for a photoresist usable lithography process using ultra-short wavelength light source such as KrF(.lambda.=248 .mu.m), ArF(.lambda.=193 .mu.m), X-ray, ion beam, E-beam and EUV (Extreme Ultra Violet) which is a potentially applicable technology to the fabrication of a fine circuit of a highly integrated semiconductor device.

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