Stock material or miscellaneous articles – Composite – Of silicon containing
Reexamination Certificate
2005-07-12
2005-07-12
Buttner, David J. (Department: 1712)
Stock material or miscellaneous articles
Composite
Of silicon containing
C430S287100, C430S270100, C430S286100, C430S311000, C526S321000, C526S328500, C526S347000, C526S268000, C526S279000, C528S026000, C528S032000, C528S041000
Reexamination Certificate
active
06916543
ABSTRACT:
Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.
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International Search Report Application No. PCT/US03/34832 dated Apr. 29, 2004.
De Binod B.
Dilocker Stephanie J.
Dimov Ognian N.
Malik Sanjay
Arch Specialty Chemicals, Inc.
Buttner David J.
Keehan Christopher
Ohlandt Greeley Ruggiero & Perle LLP
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