Copolymer of sulfur dioxide and polyalkylpolysilylstyrene

Details Copolymer of sulfur dioxide and polyalkylpolysilylstyrene Copolymer of sulfur dioxide and polyalkylpolysilylstyrene

1988-07-22

1989-12-19

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

525536, 528 24, 528 32, 528385, C08F 3008

Patent

active

048883921

ABSTRACT:
A copolymer of sulfur dioxide and polyalkylpolysilylstyrene composed of repeating units of formula I: ##STR1## where R is a lower alkyl group, p is an integer between 2 and 5, q in an integer between 1 and 10 representing the sequence length of polyalkylpolysilylstyrene, and n is a number between 5 and 10,000, and having a number-average molecular weight of 2,000 to 2,000,000. This copolymer is a novel and useful positive resist material which is highly sensitive to light, or electron-beam or X-ray radiation and is of high dry etching resistance.

REFERENCES:
patent: 2833801 (1958-05-01), Holbrook
patent: 3272282 (1966-09-01), Lang
patent: 3336273 (1967-08-01), Youngman et al.

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