Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Reexamination Certificate
2011-06-14
2011-06-14
Boykin, Terressa M (Department: 1765)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
C430S270100, C524S150000, C524S160000, C526S266000, C526S286000, C528S271000, C528S480000
Reexamination Certificate
active
07960494
ABSTRACT:
To provide a copolymer for semiconductor lithography employed for forming a resist film as well as thin films such as an anti-reflection film, a gap-filling film, a top coating film, etc. which are formed on or under a resist film, these films being employed in semiconductor lithography, wherein the copolymer has excellent solubility in a solution of a thin film-forming composition and prevents generation of microparticles (e.g., microgel) and pattern defects, and to provide a method for producing the copolymer reliably on an industrial scale.The invention is directed to a copolymer for semiconductor lithography having at least one repeating unit selected from among (A) a repeating unit having a hydroxyl group; (B) a repeating unit having a structure in which a hydroxyl group is protected by a group which inhibits dissolution in an alkaline developer and which dissociates by the action of an acid; (C) a repeating unit having a lactone structure; and (D) a repeating unit having a cyclic ether structure, wherein, when a solution of the copolymer in propylene glycol monomethyl ether acetate having a viscosity of 15 mPa·sec is caused to pass through a filter having a pore size of 0.03 μm under a pressure difference of 0.1 MPa for 60 minutes, the solution exhibits an average flow rate per unit filter area of 200 g/min/m2or more, and to a method for producing the copolymer.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4603101 (1986-07-01), Crivello
patent: 5069997 (1991-12-01), Schwalm et al.
patent: 5118585 (1992-06-01), Schwalm et al.
patent: 5968713 (1999-10-01), Nozaki et al.
patent: 6013416 (2000-01-01), Nozaki et al.
patent: 6200725 (2001-03-01), Takechi et al.
patent: 6242161 (2001-06-01), Kawaguchi et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6388101 (2002-05-01), Hada et al.
patent: 6489432 (2002-12-01), Jung et al.
patent: 6706826 (2004-03-01), Fujiwara et al.
patent: 6780953 (2004-08-01), Jung et al.
patent: 7186495 (2007-03-01), Maeda et al.
patent: 7432035 (2008-10-01), Maeda et al.
patent: 7517633 (2009-04-01), Takei et al.
patent: 2004/0167298 (2004-08-01), Yamagishi et al.
patent: 2008/0114139 (2008-05-01), Yamagishi et al.
patent: 59-45439 (1984-03-01), None
patent: 62-115440 (1987-05-01), None
patent: 5-113667 (1993-05-01), None
patent: 9-73173 (1997-03-01), None
patent: 9-90637 (1997-04-01), None
patent: 10-26828 (1998-01-01), None
patent: 10-161313 (1998-06-01), None
patent: 10-207069 (1998-08-01), None
patent: 2000-26446 (2000-01-01), None
patent: 2000-313779 (2000-11-01), None
patent: 2001-27810 (2001-01-01), None
patent: 2001-192411 (2001-07-01), None
patent: 2001-201856 (2001-07-01), None
patent: 2001-226324 (2001-08-01), None
patent: 2001-242627 (2001-09-01), None
patent: 2002-194029 (2002-07-01), None
patent: 2003-57828 (2003-02-01), None
patent: 2003 186196 (2003-07-01), None
patent: 2003-246825 (2003-09-01), None
patent: 2004 231950 (2004-08-01), None
patent: 2004 269855 (2004-09-01), None
patent: 2004269855 (2004-09-01), None
patent: 2006 176573 (2006-07-01), None
patent: 2006-193687 (2006-07-01), None
patent: 2006176573 (2006-07-01), None
patent: 2006-243308 (2006-09-01), None
patent: WO 99/50322 (1999-10-01), None
U.S. Appl. No. 12/872,461, filed Aug. 31, 2010, Yamagishi, et al.
Kudo Masaaki
Yamagishi Takanori
Yamaguchi Satoshi
Boykin Terressa M
Maruzen Petrochemical Co. Ltd.
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
LandOfFree
Copolymer for semiconductor lithography and process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Copolymer for semiconductor lithography and process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copolymer for semiconductor lithography and process for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2687975