Copolymer for positive type lithography, polymerization...

Details Copolymer for positive type lithography, polymerization... Copolymer for positive type lithography, polymerization...

2007-05-04

2011-11-29

Choi, Ling (Department: 1762)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S280000, C526S281000, C526S307500

Reexamination Certificate

active

08067516

ABSTRACT:
A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A)[in the formula (A), R10is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B)[in the formula (B), R21is a hydrocarbon group which may contain nitrogen atom; R22is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain].The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g. dissolution contrast).

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