Copolyamide or copolyimide-amide containing sulfo groups

Details Copolyamide or copolyimide-amide containing sulfo groups Copolyamide or copolyimide-amide containing sulfo groups

1992-12-03

1994-06-21

Anderson, Harold D.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528170, 528172, 528226, 528321, 528322, 528345, 528348, 528349, 528352, C08G 6932, C08G 7314

Patent

active

053229223

ABSTRACT:
Mixtures of salts of organic carboxylic acids and organic compounds of non-salt character, dissolved in a C.sub.1 -C.sub.4 alkanol, can be concentrated or separated with a semipermeable membrane made from a copolyamide or copolyimide-amide which contains (a) a first aromatic diamine radical and (b) a second aromatic diamine radical which carries --SO.sub.3 M groups, where M is H.sup..sym., a monovalent to polyvalent metal cation or an ammonium cation. Provided the first diamine radical contains C.sub.1 -C.sub.4 alkyl groups in the o-positions to the amino groups, the copolymers are radiation-sensitive and can be used for producing protective layers or relief images, development being carried out in an aqueous alkaline medium.

REFERENCES:
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patent: 4217227 (1980-08-01), Elfert et al.
patent: 4694061 (1987-09-01), Pfeifer
patent: 4714669 (1987-12-01), Pfeifer et al.
patent: 4904389 (1990-02-01), Waldhoff et al.
patent: 5198119 (1993-03-01), Berger et al.
Chem. Abst., 110, 25827c (1989).
Patent Abstracts of Japan, vol. 13, No. 190 (C-593)(3538)(1989).

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