Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2011-06-14
2011-06-14
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
07961334
ABSTRACT:
A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).
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“Pattern Placement Metrology for Mask Making” Dr. Carola Blasing Leic Microsystems AG Semicon Education Program, Geneva, Mar. 31, 1998.
Adam Klaus-Dieter
Boesser Hans-Artur
Heiden Michael
Connolly Patrick J
Simpson & Simpson PLLC
Vistec Semiconductor Systems GmbH
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