Cooling system for a semiconductor device and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – With provision for cooling the housing or its contents

Reexamination Certificate

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C257S714000, C257S720000, C257SE23145

Reexamination Certificate

active

11317298

ABSTRACT:
A cooling system for a semiconductor substrate incudes a plurality of trenches formed from a backside of the semiconductor substrate, and thermally conductive material deposited in the plurality of trenches. A method of forming cooling elements in a semiconductor substrate, includes coating a backside of the semiconductor substrate with a first mask layer, forming a plurality of trench patterns in the first mask layer, etching the semiconductor substrate to form a plurality of trenches along the plurality of trench patterns, and depositing thermally conductive material in the plurality of trenches. Trenches constructed from the backside of a wafer improve efficiency of heat transfer from a front-side to the backside of an integrated-circuit chip. The fabrication of trenches from the backside of the wafer allows for increases in the depth and number of trenches, and provides a means to attach passive and active cooling devices directly to the backside of a wafer.

REFERENCES:
patent: 5403783 (1995-04-01), Nakanishi et al.
patent: 5532906 (1996-07-01), Hanari et al.
patent: 6528878 (2003-03-01), Daikoku et al.
patent: 6607928 (2003-08-01), Eiles et al.
Wolf, Silicon Processing for the VLSI Era vol. 2-Process Integration, pp. 51-54, 1990.

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