Convex profile anode for electroplating system

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

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C204S280000, C204S292000

Reexamination Certificate

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07014739

ABSTRACT:
An electroplating anode including a substantially convex oxidizing surface for oxidation of metal atoms in a semiconductor wafer electroplating process. The electroplating anode of the present invention substantially prolongs the lifetime of the anode and contributes to the prevention of wafer contamination due to generation of potential wafer-contaminating precipitate particles during a wafer electroplating process.

REFERENCES:
patent: 5443707 (1995-08-01), Mori
patent: 6113759 (2000-09-01), Uzoh
patent: 6391168 (2002-05-01), Ueno

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