Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2007-04-18
2009-10-13
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
C427S585000, C427S587000, C427S596000
Reexamination Certificate
active
07601393
ABSTRACT:
A system and method for that allows one part of an atomic layer deposition (ALD) process sequence to occur at a first temperature while allowing another part of the ALD process sequence to occur at a second temperature. In such a fashion, the first temperature can be chosen to be lower such that decomposition or desorption of the adsorbed first reactant does not occur, and the second temperature can be chosen to be higher such that comparably greater deposition rate and film purity can be achieved. Additionally, the invention relates to improved temperature control in ALD to switch between these two thermal states in rapid succession.
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Chiang Tony P.
Leeser Karl F.
Gambetta Kelly M
Meeks Timothy
Novellus Systems Inc.
Ogonowsky Brian D.
Patent Law Group LLP
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