Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1979-02-14
1981-01-20
Smith, John D.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
204164, 204192S, 427 82, 427 85, 427 87, 427 93, 156643, H01L 2130, H01L 21324, H01L 21316
Patent
active
042462967
ABSTRACT:
An improved technique for growing native films on compound semiconductors is disclosed. In this technique, additional preferential chemistry is used in conjunction with prior art growth processes to eliminate what would otherwise be unreacted constituents in the native film. Films grown using this technique display improved electrical properties.
REFERENCES:
patent: 3287243 (1966-11-01), Ligenza
patent: 3297500 (1967-01-01), Drake et al.
patent: 3692571 (1972-09-01), Colton et al.
patent: 3890169 (1975-06-01), Schwartz et al.
patent: 3907616 (1975-09-01), Wiemer
patent: 3914465 (1975-10-01), Dyment et al.
patent: 4062747 (1977-12-01), Chang et al.
patent: 4144634 (1979-03-01), Chang et al.
patent: 4170666 (1979-10-01), Pancholy et al.
patent: 4172906 (1979-10-01), Pancholy
patent: 4183780 (1980-01-01), McKenna et al.
Bondur et al., "Ion Implanted Emitters Defined by Plasma Etching," IBM TDB, 18, No. 8, 1-1976.
Ma et al., "Selective Oxidation of Silicon in Oxygen Plasma," IBM TDB, 19, No. 9, 2-1977.
Stirn et al., "Technology of GaAs Metal-Oxide-Semiconductor Solar Cells," IEEE Transactions on Electron Devices, vol. EP-24, No. 4, 4-1977.
Chang, "Some Properties of Plasma-Grown GaAs Oxides," Thin Solid Films, 56, pp.v89-106, 1-1979.
Bell Telephone Laboratories Incorporated
Dworetsky Samuel H.
Smith John D.
LandOfFree
Controlling the properties of native films using selective growt does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Controlling the properties of native films using selective growt, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Controlling the properties of native films using selective growt will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1767190