Controlling or modeling a chemical vapor infiltration...

Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating

Reexamination Certificate

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C427S008000

Reexamination Certificate

active

07727591

ABSTRACT:
A load comprising one or more porous substrates (10) for densification is heated in an oven into which a reaction gas containing at least one carbon-precursor hydrocarbon is admitted, the effluent gas being extracted from the oven via an extraction pipe (26) connected to an outlet from the oven. The content in the effluent gas of at least one compound selected from allene, propine, and benzene is measured, and as a function of the measured content, the process is controlled by adjusting at least one parameter selected from the rate at which the reaction gas is admitted into the oven, the rate at least one component of the reaction gas is admitted into the oven, the transit time of the gas through the oven, the temperature to which the substrate(s) is/are heated, and the pressure that exists inside the oven. The at least one parameter is adjusted in such a manner as to maintain the measured content at a value which is substantially constant. A densification process can thus be controlled in real time or modelled.

REFERENCES:
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patent: 6210745 (2001-04-01), Gaughan et al.
patent: WO 96/15285 (1996-05-01), None
Glasier et al. Formation of pyrolytic carbon during the pyrolysis of ethane at high conversions. Carbon 39 (2001) 15-23.
Birakayala et al. A reduced reaction model for carbon CVD/CVI processes. Carbon 40 (2002) 675-683.
Chemical Vapor Infiltration, http://en.wikipedia.org/wiki/Chemical—vapor—infiltration. Retrieved Sep. 30, 2009.
Glasier, G.F. et al: “Formation of pyrolytic carbon during the pyrolysis of ethane at high conversions,” Carbon, Elsevier Science Publishing, New York, NY, vol. 39, No. 1, pp. 15-23 (Jan. 2001).
Becker, A., et al: “Chemistry and kinetics of chemical vapor deposition of pyrocarbon—II pyrocarbon deposition from ethylene, acetylene and 1,3-butadiene in the low temperature regime,” Carbon, Elsevier Science Publishing, New York, NY, vol. 36, No. 3, pp. 177-199 (1998).
Delhaes, P.: “Chemical vapor deposition and infiltration processes of carbon materials,” Carbon, Elsevier Science Publishing, New York, NY, vol. 40, No. 5, pp. 641-657 (Apr. 2002).

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