Controlling groove dimensions for enhanced slurry flow

Abrading – Abrading process – Glass or stone abrading

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451527, 451534, B24B 100

Patent

active

058881212

ABSTRACT:
A polishing pad surface designed for chemical mechanical polishing of substrates is described. The polishing pad includes a first area of the surface having formed thereon a first set of grooves and a second area of the surface having formed thereon a second set of grooves, wherein the first set of grooves have a larger cross-sectional area than the second set of grooves.

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