Wells – Processes – Chemical inter-reaction of two or more introduced materials
Reexamination Certificate
2006-08-22
2006-08-22
Bates, Zakiya W. (Department: 3676)
Wells
Processes
Chemical inter-reaction of two or more introduced materials
C166S308300, C166S308500
Reexamination Certificate
active
07093659
ABSTRACT:
Methods and compositions are provided for treating a subterranean formation penetrated by a well. The method includes the steps of: (a) forming a treatment fluid, and (b) introducing the treatment fluid into the well and into contact with the formation. The treatment fluid includes: (1) water; (2) a water-soluble polysaccoharide capable of increasing the viscosity of the water or a water-soluble polysaccharide and a crosslinking agent for the water-soluble polysaccharide; (3) a breaker comprising at least one member selected from the group consisting of a source of chlorite ions and a source of hypochlorite ions; and (4) a breaker moderator comprising at least one member selected from the group consisting of a source of magnesium ions and a source of calcium ions.
REFERENCES:
patent: 4961466 (1990-10-01), Himes et al.
patent: 5067565 (1991-11-01), Holtmyer et al.
patent: 5413178 (1995-05-01), Walker et al.
patent: 5624886 (1997-04-01), Dawson et al.
patent: 5669446 (1997-09-01), Walker et al.
patent: 5669447 (1997-09-01), Walker et al.
patent: 5950731 (1999-09-01), Shuchart et al.
patent: 6176315 (2001-01-01), Reddy et al.
patent: 6213213 (2001-04-01), Van Batenburg et al.
patent: 6214773 (2001-04-01), Harris et al.
patent: 6342467 (2002-01-01), Chang et al.
patent: 6357527 (2002-03-01), Norman et al.
patent: 6488091 (2002-12-01), Weaver et al.
patent: 6494263 (2002-12-01), Todd
patent: 6702023 (2004-03-01), Harris et al.
patent: 2002/0125012 (2002-09-01), Dawson et al.
Hauge Robert
Powell Ronald J.
Bates Zakiya W.
Crutsinger & Booth
Halliburton Energy Service,s Inc.
Kent Robert A.
LandOfFree
Controlling chlorite or hypochlorite break rate of well... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Controlling chlorite or hypochlorite break rate of well..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Controlling chlorite or hypochlorite break rate of well... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3660577