Controlled vapor chamber cooking device

Stoves and furnaces – Liquid heater – Open-top vessel that may include lid

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Details

165105, 165134, 236 99R, 432 91, A47J 3700

Patent

active

039687872

ABSTRACT:
A vapor chamber cooking device is disclosed wherein a capillary wick is disposed along the bottom surface of a sealed vapor chamber, the top wall of which provides a cooking surface. A plurality of internal structural support members having vapor pressure equilization holes are disposed between the wick and the upper surface of the chamber and secured to the upper chamber surface. A quantity of volatile working fluid is disposed in the chamber sufficient to saturate the wick when in a liquid state. An arrangement is provided for heating the chamber to vaporize working fluid contained therein, and a feedback control arrangement responsive to the vapor pressure within the chamber controls the heating arrangement to maintain the chamber vapor pressure within a predetermined range. Additional arrangements may be provided to respond to predetermined conditions of overpressure within the chamber to relieve the overpressure conditions.

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