Controlled vacuum arc material deposition, method and apparatus

Details Controlled vacuum arc material deposition, method and apparatus Controlled vacuum arc material deposition, method and apparatus

1986-02-04

1987-06-16

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

118 501, 118723, 204298, 427 37, 427 47, C23C 1422

Patent

active

046734775

ABSTRACT:
A method and apparatus for vacuum arc deposition of material on a surface of an object uses a vacuum chamber accommodating the active surface of the cathode and an anode. A power supply connected to the anode and cathode establishes an electric arc. The track of the arc is controlled with a magnetic field established with a permanent magnet that is moved in a closed path relative to the cathode. A solenoid modifies the main magnetic field produced on the active surface of the cathode.

REFERENCES:
patent: 3625848 (1971-12-01), Snapper
patent: 3956093 (1976-05-01), McLeod
patent: 4444643 (1984-04-01), Garrett
patent: 4448799 (1984-05-01), Bergman et al.
D. Hadfield, Permanent Magnets and Magnetism, Iliffe Books Ltd., London, 1962, pp. 213-214.

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